TY  - JOUR
Haibo Li; Qian Yang; Jia Sun; Jie Li; Meng Guo; Bing LiT1  - Improvement of Environment Stability of an i-Line Chemically Amplified Photoresist
JO  - Journal of Microelectronic Manufacturing
VL  - 4
Y1  - 
UR  - http://www.jommpublish.org/p/55/73/
L1  - http://www.jommpublish.org/jomm_data/publish/AB/0D/DF/6A71CB4ABE98C1E35BE4B29803/10.33079.jomm.21040201.pdf
DO  - 10.33079/jomm.21040201
ER  -