TY  - JOUR
Tao Zhou; Xuelong Shi; Chen Li; Yan Yan; Bowen Xu; Shoumian Chen; Yuhang Zhao; Wenzhan Zhou; Kan Zhou; Xuan ZengT1  - Fast and Robust DCNN Based Lithography SEM Image Contour Extraction Models
JO  - Journal of Microelectronic Manufacturing
VL  - 4
Y1  - 2021/03/25
UR  - http://www.jommpublish.org/p/183/70/
L1  - http://www.jommpublish.org/jomm_data/publish/CA/9F/DC/3D532846CC82439B0B978239E6/10.33079.jomm.21040102.pdf
DO  - 10.33079/jomm.21040102
ER  -