TY  - JOUR
Xiaoting Li; Rui Chen; Lei Qu; Xuanmin Zhu; Jing Zhang; Yanrong Wang; Shuhua Wei; Jiang Yan; Yayi WeiT1  - Analysis of Current Research Status of Plasma Etch Process Model
JO  - Journal of Microelectronic Manufacturing
VL  - 1
Y1  - 2018/09/30
UR  - http://www.jommpublish.org/p/183/16/
L1  - http://www.jommpublish.org/jomm_data/publish/2A/D0/9E/E6EC864196AFDC1541947466E1/10.33079.jomm.18010104_Vuj61Ro.pdf
DO  - 10.33079/jomm.18010104
ER  -